もっと例文: 1 2
- There are also processes involving oxygen plasma and corona discharge.
- The wafers can be cleaned using H 2 O 2 + H 2 SO 4 or oxygen plasma.
- The surface of conventional activated carbon is reactive, capable of oxidation by atmospheric oxygen and oxygen plasma steam, and also carbon dioxide
- Typically, monatomic oxygen plasma is created by exposing oxygen gas at a low pressure ( O 2 ) to high power radio waves, which ionise it.
- Dry etching is used in conjunction with micromachining and display production, the removal of organic residues by oxygen plasmas is sometimes correctly described as a dry etch process.